A Versatile Experimental CVD Tool for R&D and Small Scale Production.

High Temperature, 1080 C (24" Hot Zone: 126 Cubic In.)
High Purity Quartz Tube with Water Cooled End Caps.
Broad Pressure Range of Atmosphere to 10-3 Torr.
Upgradable to High Vacuum.
Computer Interfaceable.
Small Footprint (26" x 48"), Portable with caster mounts.


Burnbox / Scrubber.
Plasma Enhancement.
Ozone Generator.
Safety Enclosures.


Depositions of Si3N4, Mo2S3, PBN, SiO2, Tungsten, BPSG, P-Si, Graphite, and many other chemistries.


TEK-VAC's model CVD-300-M is an easy to use and ready to operate chemical vapor deposition system for use in a variety of thin film applications. The system has built in versatility the enhances its ability to accomodate many processes with excellent reproducibility. A compact footprint lends itself to restricted laboratory space without jeopardizing accessibility.

Uniform temperature profiles of +10 C are maintained for an area of 3"dia. x 15". Fine temperature regulation of the reactor region is achieved with the use of insulated ceramic fiber, high wattage density heaters capable of rapid heat up with minimal thermal losses. A thermocouple sensor, located centrally in the hot zone, outputs to a digital temperature controller complete with P.I.D. functions. Stepless control of the heating elements is accomplished through the use of an SCR power pack.
Susceptor or substrate introduction is accomplished via an O-ring sealed downstream port. All materials and wetted surfaces are chemically cleaned and passivated to ensure a contaminant free environment. Water cooled tube adaptors firmly grasp the quartz reactor without stress, and effectively seal the reaction chamber leak tight to a mass spectrometer leak detector.

Two mass flow controllers are supplied with the basic system to regulate the upstream gas flow into the reaction chamber. The flow controllers offer rapid response time and low hysteresis. Flow rates and flow corrections are front panel adjustable. Up to eight flow controllers can be incorporated by expansion of the existing stainless steel manifolding. Precise reactor pressure regulation is accomplished by a downstream throttle valve controlled by a capacitance manometer located in the reactor region.